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World’s leading manufacturer of LEEM & PEEM systems since 1995.

Our Latest Development:
Prototype of an Aberration Corrected LEEM / PEEM

Highlights:

  • Calculated resolution <3 nm at
    • 8 times more intensity
  • Easy checking of image enhancement
  • Fast switching between corrected and
    • non-corrected modes
  • Upgrade possible for all of our magnetic LEEM and PEEM systems

First results presented during the 5th International Conference on LEEM/PEEM 
October 2006:

Pb layer on Mo(100) surface

FOV 3 µm

Pb layer on Mo(100) surface

FOV 1 µm

LEEM

ACLEEM

LEEM

ACLEEM